Interdisciplinary Resource Center for Nanotechnology

...going for nano


Scanning Helium Ion Microscope is a novel device that incorporate both Focused Ion Beam and Scanning Electron Mycroscopy approaches. Being a very surface tool due to the origin of ion beam with solid interaction it is also the first scanning microscope with a subnanometer resolution (theoretical resolution limit is 0.25 nm) .

Scanning ion helium microscope Zeiss ORION


Low beam convergence provides high focus depth.

Helium ion beam shows very little diffraction influence because of He ions mass. Since the helium ion beam is much less affected by diffraction, than the electron beam, it can be focused to a smaller probe, enabling sub-nanometer resolution. Features of ions scattering result in high material contrast.

Another feature of helium ion microscope is low beam current, three orders of magnitude lower than typical SEM beam current. It allows to prevent destruction of sample caused by ion beam and  to reduce charging of non-conductive specimen surface.

Flood gun charge compensation system allows to work with insulator samples without resolution deterioration.

Parameters of scanning ion microscope Zeiss ORION:

Acceleration voltage 10-40 kV.

Ion beam current: 0,1-100 pA.

Sharpness edge resolution : 0,6 nm.

Backscattered ions detector.


NanoMaker lithography system


NanoMaker is a software/hardware system from Interface Ltd. for SEM/FIB based lithography.
System allows performing  ion beam lithography, ion beam milling and image aquisition and compensates static distortion and dynamic delays of deflecting system.

Additional software for FIB milling simulation considering sputtering rate angle dependence allows performing data correction for 3D-shapes manufacturing.